How stable are the TSKgel HIC resins?

How stable are the TSKgel HIC resins?
FAQ from TOSOH
The G5000PW base material used as the support matrix for Ether and Phenyl 5-PW HIC columns is physically and chemically stable in water (pH 2-12) and in up to 50% polar organic solvents such as methanol, ethanol, and acetonitrile.
FAQ from TOSOH
The G5000PW base material used as the support matrix for Ether and Phenyl 5-PW HIC columns is physically and chemically stable in water (pH 2-12) and in up to 50% polar organic solvents such as methanol, ethanol, and acetonitrile.